Invention Grant
- Patent Title: Mask fitting system and method
- Patent Title (中): 面罩配合系统及方法
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Application No.: US11878798Application Date: 2007-07-26
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Publication No.: US08254637B2Publication Date: 2012-08-28
- Inventor: Mark Alexander Abourizk , Paul Anthony Green , Robert Edward Henry , Karthikeyan Selvarajan , Joanne Elizabeth Drew
- Applicant: Mark Alexander Abourizk , Paul Anthony Green , Robert Edward Henry , Karthikeyan Selvarajan , Joanne Elizabeth Drew
- Applicant Address: AU Bella Vista
- Assignee: ResMed Limited
- Current Assignee: ResMed Limited
- Current Assignee Address: AU Bella Vista
- Agency: Nixon & Vanderhye PC
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G01B11/24

Abstract:
Systems and methods for selecting a mask system for a patient are provided. Certain example embodiments include generating 3D contours of patients and selecting mask systems based at least on these contours. These contours may be generated by using, for example, a cushion of translatable pins, a nasal cannular scanning device, and/or a shadow stereopsis sensor. Certain other example embodiments allow images and/or videos to be captured and optionally synchronized. Then, images of various mask systems may be overlaid to determine how well a mask system fits. In still other embodiments, a user can hold a transparency corresponding to a mask design in front of the patient's face to determine how well a mask system fits.
Public/Granted literature
- US20080060652A1 Mask fitting system and method Public/Granted day:2008-03-13
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