Invention Grant
US08254663B2 Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removability
有权
使用具有假图像去除性的多级TDI图像传感器进行超细光刻图案检查
- Patent Title: Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removability
- Patent Title (中): 使用具有假图像去除性的多级TDI图像传感器进行超细光刻图案检查
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Application No.: US12395840Application Date: 2009-03-02
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Publication No.: US08254663B2Publication Date: 2012-08-28
- Inventor: Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
- Applicant: Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,NEC Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,NEC Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-068918 20080318
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.
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