Invention Grant
- Patent Title: Wafer defect detection system and method
- Patent Title (中): 晶圆缺陷检测系统及方法
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Application No.: US12566448Application Date: 2009-09-24
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Publication No.: US08255172B2Publication Date: 2012-08-28
- Inventor: Ditza Auerbach
- Applicant: Ditza Auerbach
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agent Tarek N. Fahmi, APC
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
Random defects and repeaters accommodated on a wafer are detected using slice information obtained by scanning a plurality of wafer slices; analyzing defect information using a first set of filters selected to detect random defects, thereby generating a first set of defects per slice, analyzing the defect information using a second set of filters selected to detect repeaters, thereby providing a second set of defects per slice; analyzing a plurality of the second sets of defects per slice using a third set of filters selected to detect repeater families, thereby providing a set of repeaters per wafer; and optionally combining the set of repeaters per wafer with a plurality of the first sets of defects per slice, thereby generating one or more defect maps indicative of random defects and/or repeaters.
Public/Granted literature
- US20100076699A1 WAFER DEFECT DETECTION SYSTEM AND METHOD Public/Granted day:2010-03-25
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