Invention Grant
- Patent Title: Pulsed chemical dispense system
- Patent Title (中): 脉冲化学分配系统
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Application No.: US12162624Application Date: 2007-02-01
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Publication No.: US08257506B2Publication Date: 2012-09-04
- Inventor: Olivier Dubreuil , Srdjan Kordic , Theodore Carambeeris
- Applicant: Olivier Dubreuil , Srdjan Kordic , Theodore Carambeeris
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP06300098 20060201
- International Application: PCT/EP2007/050965 WO 20070201
- International Announcement: WO2007/088182 WO 20070809
- Main IPC: B08B7/00
- IPC: B08B7/00 ; B08B7/04 ; B08B3/00 ; B08B3/04

Abstract:
The present invention relates to a cost saving liquid-treatment unit (100). According to the invention, a control unit (152), which is connected to an input port of a control valve (118, 120, 122), is adapted to set, in dependence on the evaporation rate of a treatment liquid on the substrate at the given or desired temperature of the substrate and/or at the given or desired pressure of a gaseous ambient atmosphere at the substrate, a number of dispense pulses to be applied to the substrate for the liquid treatment, a respective pulse duration of individual dispense pulses, and respective dispense-interruption time spans between the individual dispense pulses. This way, the use of treatment liquid is reduced to a minimum amount, thus reducing costs for providing and cleaning treatment liquid.
Public/Granted literature
- US20090007938A1 Pulsed Chemical Dispense System Public/Granted day:2009-01-08
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