Invention Grant
US08257888B2 Particle beam writing method, particle beam writing apparatus and maintenance method for same
有权
粒子束写入方法，粒子束写入装置及其维护方法相同
- Patent Title: Particle beam writing method, particle beam writing apparatus and maintenance method for same
- Patent Title (中): 粒子束写入方法，粒子束写入装置及其维护方法相同
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Application No.: US12605949Application Date: 2009-10-26
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Publication No.: US08257888B2Publication Date: 2012-09-04
- Inventor: Martin Sczyrba , Christian Buergel , Eugen Foca
- Applicant: Martin Sczyrba , Christian Buergel , Eugen Foca
- Applicant Address: DE
- Assignee: Advanced Mask Technology Center GmbH + Co. KG
- Current Assignee: Advanced Mask Technology Center GmbH + Co. KG
- Current Assignee Address: DE
- Agency: Mayback & Hoffman, P.A.
- Agent Gregory L. Mayback; Thomas Bethea
- Priority: DE102008053180 20081024
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
A first exposure dose for a shot area based upon layout data is determined. A correction dose compensating a dose deviation between a first point in time, at which a control unit configured to control a shot time period of a particle beam writing apparatus considers a charged particle beam as having reached a nominal current density, and a second point in time, at which the charged particle beam has actually reached a nominal current density, at a target substrate is determined.
Public/Granted literature
- US20100104961A1 Particle Beam Writing Method, Particle Beam Writing Apparatus and Maintenance Method for Same Public/Granted day:2010-04-29
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