Invention Grant
- Patent Title: Method of process optimization for dual tone development
- Patent Title (中): 双音发展的过程优化方法
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Application No.: US12198853Application Date: 2008-08-26
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Publication No.: US08257911B2Publication Date: 2012-09-04
- Inventor: Roel Gronheid , Sophie Bernard , Carlos A. Fonseca , Mark Somervell , Steven Scheer
- Applicant: Roel Gronheid , Sophie Bernard , Carlos A. Fonseca , Mark Somervell , Steven Scheer
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process.
Public/Granted literature
- US20100055625A1 METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT Public/Granted day:2010-03-04
Information query
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