Invention Grant
- Patent Title: Protecting semiconducting oxides
- Patent Title (中): 保护半导体氧化物
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Application No.: US11924678Application Date: 2007-10-26
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Publication No.: US08258021B2Publication Date: 2012-09-04
- Inventor: Tse Nga Ng , Michael L. Chabinyc
- Applicant: Tse Nga Ng , Michael L. Chabinyc
- Applicant Address: US CA Palo Alto
- Assignee: Palo Alto Research Center Incorporated
- Current Assignee: Palo Alto Research Center Incorporated
- Current Assignee Address: US CA Palo Alto
- Agency: Hollingsworth Davis, LLC
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
In transistor structures such as thin film transistors (TFTs) in an array of cells, a layer of semiconducting oxide material that includes a channel is protected by a protective layer that includes low-temperature encapsulant material. The semiconducting oxide material can be a transition metal oxide material such as zinc oxide, and can be in an active layered substructure that also includes channel end electrodes. The low-temperature encapsulant can, for example, be an organic polymer such as poly(methyl methacrylate) or parylene, deposited on an exposed region of the oxide layer such as by spinning, spin-casting, evaporation, or vacuum deposition or an inorganic polymer deposited such as by spinning or liquid deposition. The protective layer can include a lower sublayer of low-temperature encapsulant on the exposed region and an upper sublayer of inorganic material on the lower sublayer. For roll-to-roll processing, a mechanically flexible, low-temperature substrate can be used.
Public/Granted literature
- US20090108304A1 PROTECTING SEMICONDUCTING OXIDES Public/Granted day:2009-04-30
Information query
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