Invention Grant
US08258199B2 Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
有权
用于在聚合物基质中合成寡DNA的光酸发生剂
- Patent Title: Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
- Patent Title (中): 用于在聚合物基质中合成寡DNA的光酸发生剂
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Application No.: US13103621Application Date: 2011-05-09
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Publication No.: US08258199B2Publication Date: 2012-09-04
- Inventor: Glenn H. McGall , Andrea Cuppoletti
- Applicant: Glenn H. McGall , Andrea Cuppoletti
- Applicant Address: US CA Santa Clara
- Assignee: Affymetrix, Inc.
- Current Assignee: Affymetrix, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Steven M. Yee
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08J3/28
Abstract:
Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
Public/Granted literature
- US20110245110A1 Photoacid generators for the synthesis of oligo-DNA in a polymer matrix Public/Granted day:2011-10-06
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