Invention Grant
US08258226B2 Composition for manufacturing heat ray-shielding polyvinyl chloride film and manufacturing method of the same, and heat ray-shielding polyvinyl chloride film 有权
用于制造热射线屏蔽聚氯乙烯薄膜的组合物及其制造方法以及热射线屏蔽聚氯乙烯薄膜

  • Patent Title: Composition for manufacturing heat ray-shielding polyvinyl chloride film and manufacturing method of the same, and heat ray-shielding polyvinyl chloride film
  • Patent Title (中): 用于制造热射线屏蔽聚氯乙烯薄膜的组合物及其制造方法以及热射线屏蔽聚氯乙烯薄膜
  • Application No.: US12450963
    Application Date: 2008-04-23
  • Publication No.: US08258226B2
    Publication Date: 2012-09-04
  • Inventor: Kenichi Fujita
  • Applicant: Kenichi Fujita
  • Applicant Address: JP Tokyo
  • Assignee: Sumitomo Metal Mining Co., Ltd.
  • Current Assignee: Sumitomo Metal Mining Co., Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2007-117019 20070426
  • International Application: PCT/JP2008/057802 WO 20080423
  • International Announcement: WO2008/136317 WO 20081113
  • Main IPC: C08K3/10
  • IPC: C08K3/10
Composition for manufacturing heat ray-shielding polyvinyl chloride film and manufacturing method of the same, and heat ray-shielding polyvinyl chloride film
Abstract:
A composition for manufacturing a heat ray-shielding polyvinyl chloride film by the steps of obtaining a dispersion liquid by dispersing tungsten oxide nanoparticles expressed by a general formula WOx and/or the composite tungsten oxide nanoparticles expressed by a general formula MyWOz and having a hexaboride crystal structure, and a dispersant, into an organic solvent; obtaining a mixture by mixing a plasticizer for manufacturing a polyvinyl chloride, into this dispersion liquid; and obtaining a composition for manufacturing the heat ray-shielding polyvinyl chloride film by using a vacuum distillation method and removing the organic solvent from this mixture until a concentration of the solvent is 5 wt % or less.
Information query
Patent Agency Ranking
0/0