Invention Grant
US08258307B2 Amide compound or salt thereof, and biofilm inhibitor, biofilm remover and disinfectant containing the same
失效
酰胺化合物或其盐，生物膜抑制剂，生物膜去除剂和含有它们的消毒剂
- Patent Title: Amide compound or salt thereof, and biofilm inhibitor, biofilm remover and disinfectant containing the same
- Patent Title (中): 酰胺化合物或其盐，生物膜抑制剂，生物膜去除剂和含有它们的消毒剂
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Application No.: US11935512Application Date: 2007-11-06
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Publication No.: US08258307B2Publication Date: 2012-09-04
- Inventor: Hiroaki Suga , Jun Igarashi
- Applicant: Hiroaki Suga , Jun Igarashi
- Applicant Address: JP Tokyo JP Osaka-shi, Osaka
- Assignee: University of Tokyo,Otsuka Chemical Co., Ltd.
- Current Assignee: University of Tokyo,Otsuka Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo JP Osaka-shi, Osaka
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Main IPC: C07D211/56
- IPC: C07D211/56 ; A61K31/445
Abstract:
The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilms. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient.An amide compound or salt thereof according to the present invention is denoted by General Formula (1): wherein R1 is a hydrogen atom or a hydroxyl group, R2 is a C5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2), wherein n and m are 0 or 1.
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