Invention Grant
US08258516B2 Thin-film transistor substrate, method of manufacturing the same and display panel having the same
有权
薄膜晶体管基板及其制造方法以及具有该薄膜晶体管基板的显示面板
- Patent Title: Thin-film transistor substrate, method of manufacturing the same and display panel having the same
- Patent Title (中): 薄膜晶体管基板及其制造方法以及具有该薄膜晶体管基板的显示面板
-
Application No.: US13090868Application Date: 2011-04-20
-
Publication No.: US08258516B2Publication Date: 2012-09-04
- Inventor: Soo-Wan Yoon
- Applicant: Soo-Wan Yoon
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2006-0071166 20060728
- Main IPC: H01L33/08
- IPC: H01L33/08

Abstract:
A thin-film transistor (TFT) substrate includes a gate electrode, a gate insulation pattern, a channel pattern, a first organic insulation pattern, a source electrode and a drain electrode. The gate electrode is formed on a base substrate. The gate insulation pattern is formed on the gate electrode and is smaller than the gate electrode. The channel pattern is formed on the gate insulation pattern and the channel pattern is smaller than the gate electrode. The first organic insulation pattern is formed on the base substrate to cover the channel pattern, the gate insulation pattern and the gate electrode.
Public/Granted literature
- US20110193090A1 THIN-FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY PANEL HAVING THE SAME Public/Granted day:2011-08-11
Information query
IPC分类: