Invention Grant
- Patent Title: Semiconductor devices and semiconductor apparatuses including the same
- Patent Title (中): 包括其的半导体器件和半导体器件
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Application No.: US12219990Application Date: 2008-07-31
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Publication No.: US08258542B2Publication Date: 2012-09-04
- Inventor: Won-joo Kim , Dae-kil Cha , Tae-hee Lee , Yoon-dong Park
- Applicant: Won-joo Kim , Dae-kil Cha , Tae-hee Lee , Yoon-dong Park
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2008-0017887 20080227
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
Semiconductor devices and semiconductor apparatuses including the same are provided. The semiconductor devices include a body region disposed on a semiconductor substrate, gate patterns disposed on the semiconductor substrate and on opposing sides of the body region, and first and second impurity doped regions disposed on an upper surface of the body region. The gate patterns may be separated from the first and second impurity doped regions by, or greater than, a desired distance, such that the gate patterns do not to overlap the first and second impurity doped regions in a direction perpendicular to the first and second impurity doped regions.
Public/Granted literature
- US20090212320A1 Semiconductor devices and semiconductor apparatuses including the same Public/Granted day:2009-08-27
Information query
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