Invention Grant
- Patent Title: Field-effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US12728012Application Date: 2010-03-19
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Publication No.: US08258544B2Publication Date: 2012-09-04
- Inventor: Tetsuzo Nagahisa , John Kevin Twynam
- Applicant: Tetsuzo Nagahisa , John Kevin Twynam
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-138083 20090609
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A field-effect transistor provided with a substrate, a channel layer, a carrier supply layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer that is laminated on the carrier supply layer between the source electrode and the drain electrode, and suppresses current collapse, an opening that is formed between an edge of the first insulating layer opposing the drain electrode and the drain electrode, and a second insulating layer that is laminated on the carrier supply layer exposed in the opening.
Public/Granted literature
- US20100308373A1 FIELD-EFFECT TRANSISTOR Public/Granted day:2010-12-09
Information query
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