Invention Grant
- Patent Title: Uses of self-organized needle-type nanostructures
- Patent Title (中): 使用自组织的针状纳米结构
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Application No.: US12443261Application Date: 2007-04-10
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Publication No.: US08258557B2Publication Date: 2012-09-04
- Inventor: Daniel Gaebler , Konrad Bach
- Applicant: Daniel Gaebler , Konrad Bach
- Applicant Address: DE Erfurt
- Assignee: X-Fab Semiconductor Foundries AG
- Current Assignee: X-Fab Semiconductor Foundries AG
- Current Assignee Address: DE Erfurt
- Agency: Hunton & Williams LLP
- Priority: DE102006046131 20060928
- International Application: PCT/EP2007/053487 WO 20070410
- International Announcement: WO2008/037506 WO 20080403
- Main IPC: H01L31/062
- IPC: H01L31/062
Abstract:
The invention relates to processes for the production and elements (components) with a nanostructure (2; 4, 4a) for improving the optical behavior of components and devices and/or for improving the behavior of sensors by enlarging the active surface area. The nanostructure (2) is produced in a self-masking fashion by means of RIE etching and its material composition can be modified and it can be provided with suitable cover layers.
Public/Granted literature
- US20100117108A1 USES OF SELF-ORGANIZED NEEDLE-TYPE NANOSTRUCTURES Public/Granted day:2010-05-13
Information query
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