Invention Grant
- Patent Title: Bipolar junction transistors having a fin
- Patent Title (中): 具有翅片的双极结晶体管
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Application No.: US12618425Application Date: 2009-11-13
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Publication No.: US08258602B2Publication Date: 2012-09-04
- Inventor: Po-Yao Ke , Tao-Wen Chung , Shine Chung , Fu-Lung Hsueh
- Applicant: Po-Yao Ke , Tao-Wen Chung , Shine Chung , Fu-Lung Hsueh
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L27/082
- IPC: H01L27/082 ; H01L27/102 ; H01L29/70 ; H01L31/11

Abstract:
Design and methods for fabricating bipolar junction transistors are described. In one embodiment, a semiconductor device includes a first fin comprising a first emitter region, a first base region, and a first collector region. The first emitter region, the first base region, and the first collector region form a bipolar junction transistor. A second fin is disposed adjacent and parallel to the first fin. The second fin includes a first contact to the first base region.
Public/Granted literature
- US20100187656A1 Bipolar Junction Transistors and Methods of Fabrication Thereof Public/Granted day:2010-07-29
Information query
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