Invention Grant
- Patent Title: System and method for characterizing process variations
- Patent Title (中): 用于表征过程变化的系统和方法
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Application No.: US12617391Application Date: 2009-11-12
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Publication No.: US08258883B2Publication Date: 2012-09-04
- Inventor: Yi-Wei Chen , Chi-Wei Hu , Wei-Pin Changchien , Chin-Chou Liu
- Applicant: Yi-Wei Chen , Chi-Wei Hu , Wei-Pin Changchien , Chin-Chou Liu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H03K3/03
- IPC: H03K3/03 ; G01R23/175 ; G01R31/26

Abstract:
A system and method for characterizing process variations are provided. A circuit comprises a plurality of inverters arranged in a sequential loop, and a plurality of transmission gates, with each transmission gate coupled between a pair of serially arranged inverters. Each transmission gate comprises a first field effect transistor (FET) having a first channel, and a second FET having a second channel. The first channel and the second channel are coupled in parallel and a gate terminal of the first FET and a gate terminal of the second FET are coupled to a first control signal and a second control signal, respectively.
Public/Granted literature
- US20100176890A1 System and Method for Characterizing Process Variations Public/Granted day:2010-07-15
Information query
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