Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US12546930Application Date: 2009-08-25
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Publication No.: US08259284B2Publication Date: 2012-09-04
- Inventor: Hisashi Namba
- Applicant: Hisashi Namba
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2008-218457 20080827
- Main IPC: G03B27/52
- IPC: G03B27/52

Abstract:
An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.
Public/Granted literature
- US20100055623A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-03-04
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