Invention Grant
US08259284B2 Exposure apparatus and device manufacturing method 有权
曝光装置和装置制造方法

Exposure apparatus and device manufacturing method
Abstract:
An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.
Public/Granted literature
Information query
Patent Agency Ranking
0/0