Invention Grant
US08259285B2 Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
有权
光刻系统，器件制造方法，设定点数据优化方法以及用于产生优化设定点数据的装置
- Patent Title: Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
- Patent Title (中): 光刻系统，器件制造方法，设定点数据优化方法以及用于产生优化设定点数据的装置
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Application No.: US11638675Application Date: 2006-12-14
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Publication No.: US08259285B2Publication Date: 2012-09-04
- Inventor: Kars Zeger Troost , Jason Douglas Hintersteiner , Patricius Aloysius Jacobus Tinnemans , Wenceslao A. Cebuhar , Ronald P. Albright , Bernardo Kastrup
- Applicant: Kars Zeger Troost , Jason Douglas Hintersteiner , Patricius Aloysius Jacobus Tinnemans , Wenceslao A. Cebuhar , Ronald P. Albright , Bernardo Kastrup
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
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