Invention Grant
- Patent Title: Lithography and associated methods, devices, and systems
- Patent Title (中): 光刻及相关方法,设备和系统
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Application No.: US11793742Application Date: 2005-12-21
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Publication No.: US08259286B2Publication Date: 2012-09-04
- Inventor: Wojciech P. Maly
- Applicant: Wojciech P. Maly
- Applicant Address: US PA Pittsburgh
- Assignee: Carnegie Mellon University
- Current Assignee: Carnegie Mellon University
- Current Assignee Address: US PA Pittsburgh
- Agency: Fox Rothschild LLP
- Agent Dennis M. Carleton
- International Application: PCT/US2005/046876 WO 20051221
- International Announcement: WO2006/069340 WO 20060629
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/54

Abstract:
An apparatus for forming an energy pattern on a target, comprising a projector including a first row of spaced-apart energy outlets arranged in a first pattern, a second row of spaced apart energy outlets arranged in a second pattern, wherein the first pattern is different than the second pattern, and comprising a platform on which the target can be mounted, a motor and a controller. A method of forming a pattern in a layer of energy-sensitive material, comprising projecting a first energy pattern onto the energy-sensitive material, moving the first energy pattern relative to the layer of energy-sensitive material, projecting a second energy pattern onto the energy-sensitive material, wherein the second energy pattern is different than the first energy pattern, and moving the second energy pattern relative to the layer of energy-sensitive material.
Public/Granted literature
- US20080137051A1 Lithography and Associated Methods, Devices, and Systems Public/Granted day:2008-06-12
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