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US08259286B2 Lithography and associated methods, devices, and systems 有权
光刻及相关方法,设备和系统

Lithography and associated methods, devices, and systems
Abstract:
An apparatus for forming an energy pattern on a target, comprising a projector including a first row of spaced-apart energy outlets arranged in a first pattern, a second row of spaced apart energy outlets arranged in a second pattern, wherein the first pattern is different than the second pattern, and comprising a platform on which the target can be mounted, a motor and a controller. A method of forming a pattern in a layer of energy-sensitive material, comprising projecting a first energy pattern onto the energy-sensitive material, moving the first energy pattern relative to the layer of energy-sensitive material, projecting a second energy pattern onto the energy-sensitive material, wherein the second energy pattern is different than the first energy pattern, and moving the second energy pattern relative to the layer of energy-sensitive material.
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