Invention Grant
- Patent Title: Crystallization apparatus, crystallization method, device and phase modulation element
- Patent Title (中): 结晶装置,结晶方法,装置及相位调制元件
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Application No.: US12773577Application Date: 2010-05-04
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Publication No.: US08259375B2Publication Date: 2012-09-04
- Inventor: Yukio Taniguchi , Masakiyo Matsumura , Noritaka Akita
- Applicant: Yukio Taniguchi , Masakiyo Matsumura , Noritaka Akita
- Applicant Address: JP Tokyo-To
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-To
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-339363 20030930
- Main IPC: G03H1/00
- IPC: G03H1/00 ; G02B26/00 ; G02F1/01 ; G01J1/32 ; G01J1/00 ; H01L21/20

Abstract:
The present invention comprises a light modulation optical system having a first element which forms a desired light intensity gradient distribution to an incident light beam and a second element which forms a desired light intensity minimum distribution with an inverse peak shape to the same, and an image formation optical system which is provided between the light modulation optical system and a substrate having a polycrystal semiconductor film or an amorphous semiconductor film, wherein the incident light beam to which the light intensity gradient distribution and the light intensity minimum distribution are formed is applied to the polycrystal semiconductor film or the amorphous semiconductor film through the image formation optical system, thereby crystallizing a non-crystal semiconductor film. The pattern of the first element is opposed to the pattern of the second element.
Public/Granted literature
- US20100214641A1 CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, DEVICE AND PHASE MODULATION ELEMENT Public/Granted day:2010-08-26
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