Invention Grant
US08259392B2 Method of producing a diffractive optical element and diffractive optical element produced by such a method
有权
通过这种方法制造的衍射光学元件和衍射光学元件的制造方法
- Patent Title: Method of producing a diffractive optical element and diffractive optical element produced by such a method
- Patent Title (中): 通过这种方法制造的衍射光学元件和衍射光学元件的制造方法
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Application No.: US12030646Application Date: 2008-02-13
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Publication No.: US08259392B2Publication Date: 2012-09-04
- Inventor: Harald Volkenandt , Gundula Weiss
- Applicant: Harald Volkenandt , Gundula Weiss
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007007907 20070214
- Main IPC: G02B5/30
- IPC: G02B5/30
Abstract:
A microlithography projection exposure system has an illumination system with an illumination optical system. The latter can have at least one diffractive optical element, which is divided into multiple adjacently arranged individual elements, each of which has one specified bundle-forming and polarizing effect.
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