Invention Grant
- Patent Title: High numerical aperture catadioptric objectives without obscuration and applications thereof
- Patent Title (中): 高数值孔径反折射目标,无遮掩及其应用
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Application No.: US13267401Application Date: 2011-10-06
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Publication No.: US08259398B2Publication Date: 2012-09-04
- Inventor: Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
- Applicant: Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G02B17/00
- IPC: G02B17/00

Abstract:
Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.
Public/Granted literature
- US20120026607A1 High Numerical Aperture Catadioptric Objectives without Obscuration and Applications Thereof Public/Granted day:2012-02-02
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |