Invention Grant
- Patent Title: Photo-mask and wafer image reconstruction
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Application No.: US12475338Application Date: 2009-05-29
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Publication No.: US08260032B2Publication Date: 2012-09-04
- Inventor: Moshe E. Preil , Alex N. Hegyi , Daniel S. Abrams
- Applicant: Moshe E. Preil , Alex N. Hegyi , Daniel S. Abrams
- Applicant Address: US CA Palo Alto
- Assignee: Luminescent Technologies, Inc.
- Current Assignee: Luminescent Technologies, Inc.
- Current Assignee Address: US CA Palo Alto
- Agency: Wilson Sonsini Goodrich & Rosati
- Main IPC: G06K9/36
- IPC: G06K9/36

Abstract:
A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
Public/Granted literature
- US20120189187A9 PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION Public/Granted day:2012-07-26
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