Invention Grant
US08263675B2 Photosensitive resin composition for color filter and color filter made using the same
有权
用于滤色器的光敏树脂组合物和使用其制成的滤色器
- Patent Title: Photosensitive resin composition for color filter and color filter made using the same
- Patent Title (中): 用于滤色器的光敏树脂组合物和使用其制成的滤色器
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Application No.: US12717418Application Date: 2010-03-04
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Publication No.: US08263675B2Publication Date: 2012-09-11
- Inventor: Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong
- Applicant: Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong
- Applicant Address: KR Gumi-si
- Assignee: Cheil Industries Inc.
- Current Assignee: Cheil Industries Inc.
- Current Assignee Address: KR Gumi-si
- Agency: Summa, Additon & Ashe, P.A.
- Priority: KR10-2007-0089641 20070904
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08F2/46 ; C08J3/28 ; G03F7/033 ; G03F7/032

Abstract:
The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.
Public/Granted literature
- US20100160474A1 Photosensitive Resin Composition for Color Filter and Color Filter Made Using the Same Public/Granted day:2010-06-24
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