Invention Grant
- Patent Title: Method of fabricating a semiconductor device package
- Patent Title (中): 制造半导体器件封装的方法
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Application No.: US12153560Application Date: 2008-05-21
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Publication No.: US08266796B2Publication Date: 2012-09-18
- Inventor: Ji-Yong Park , Kyoung-Sei Choi
- Applicant: Ji-Yong Park , Kyoung-Sei Choi
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0050463 20070523
- Main IPC: H01K3/10
- IPC: H01K3/10

Abstract:
Provided is a wiring substrate, a semiconductor device package including the wiring substrate, and methods of fabricating the same. The semiconductor device package may include a wiring substrate which may include a base film. The base film may include a mounting region and a non-mounting region. The wiring substrate may further include first wiring patterns on the non-mounting region and extending into the mounting region, second wiring patterns on the first wiring patterns of the non-mounting region, and an insulating layer on the non-mounting region, and a semiconductor device which may include bonding pads. At least one of side surfaces of the second wiring patterns adjacent to the mounting region may be electrically connected to at least one of the bonding pads of the semiconductor device.
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