Invention Grant
US08267524B2 Projection system and projector with widened projection of light for projection onto a close object
有权
投影系统和投影机，其具有用于投影到近距离物体上的光的投影
- Patent Title: Projection system and projector with widened projection of light for projection onto a close object
- Patent Title (中): 投影系统和投影机，其具有用于投影到近距离物体上的光的投影
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Application No.: US12354144Application Date: 2009-01-15
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Publication No.: US08267524B2Publication Date: 2012-09-18
- Inventor: Eiji Morikuni
- Applicant: Eiji Morikuni
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Maschoff Gilmore & Israelsen
- Priority: JP2008-008809 20080118; JP2008-318002 20081215
- Main IPC: G03B21/14
- IPC: G03B21/14 ; G03B21/26
Abstract:
A projection system includes a first projector and a second projector configured to project light on a light receiving surface according to an image signal. The first projector and the second projector direct light to be supplied to the light receiving surface in a direction along the light receiving surface. A part of an image projected by the first projector overlaps with a part of an image projected by the second projector on the light receiving surface.
Public/Granted literature
- US20090185139A1 PROJECTION SYSTEM, AND PROJECTOR Public/Granted day:2009-07-23
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