Invention Grant
- Patent Title: Platen cleaning method
- Patent Title (中): 压板清洗方法
-
Application No.: US12243980Application Date: 2008-10-02
-
Publication No.: US08268081B2Publication Date: 2012-09-18
- Inventor: David Suuronen , Frederick B. Ammon , David Burgdorf , Lyudmila Stone
- Applicant: David Suuronen , Frederick B. Ammon , David Burgdorf , Lyudmila Stone
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: B08B3/04
- IPC: B08B3/04

Abstract:
A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.
Public/Granted literature
- US20100083980A1 Platen Cleaning Method Public/Granted day:2010-04-08
Information query
IPC分类: