Invention Grant
US08268408B2 Method of manufacturing composite structure, impurity removal processing apparatus, film forming apparatus, composite structure and raw material powder 有权
复合结构,杂质去除处理装置,成膜装置,复合结构和原料粉末的制造方法

  • Patent Title: Method of manufacturing composite structure, impurity removal processing apparatus, film forming apparatus, composite structure and raw material powder
  • Patent Title (中): 复合结构,杂质去除处理装置,成膜装置,复合结构和原料粉末的制造方法
  • Application No.: US11919804
    Application Date: 2006-09-27
  • Publication No.: US08268408B2
    Publication Date: 2012-09-18
  • Inventor: Tetsu Miyoshi
  • Applicant: Tetsu Miyoshi
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2005-289261 20050930
  • International Application: PCT/JP2006/319814 WO 20060927
  • International Announcement: WO2007/037498 WO 20070405
  • Main IPC: B05D3/00
  • IPC: B05D3/00 B05D5/12
Method of manufacturing composite structure, impurity removal processing apparatus, film forming apparatus, composite structure and raw material powder
Abstract:
A film forming apparatus for forming a film according to an AD method in which separation of the film or generation of hillocks is suppressed when the film formed on a substrate is heat-treated. The apparatus includes: an aerosol generating unit (1-4) for dispersing raw material powder (20) with a gas, thereby aerosolizing the raw material powder (20); a processing unit (6) for processing the raw material powder (20) aerosolized by the aerosol generating unit (1-4) to reduce an amount of impurity, which generates a gas by being heated, adhering to or contained in the raw material powder (20); and an injection nozzle (9) for spraying the aerosolized raw material powder (20) processed by the processing unit (6) toward a substrate (30) to deposit the raw material powder (20) on the substrate (30).
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