Invention Grant
- Patent Title: Method for manufacturing LCD with reduced mask count
- Patent Title (中): 制造减少面罩数量的LCD的方法
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Application No.: US12325584Application Date: 2008-12-01
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Publication No.: US08268654B2Publication Date: 2012-09-18
- Inventor: Saishi Fujikawa , Yoko Chiba
- Applicant: Saishi Fujikawa , Yoko Chiba
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2007-312900 20071203
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/02

Abstract:
The number of photomasks is reduced in a method for manufacturing a liquid crystal display device which operates in a fringe field switching mode, whereby a manufacturing process is simplified and manufacturing cost is reduced. A first transparent conductive film and a first metal film are sequentially stacked over a light-transmitting insulating substrate; the first transparent conductive film and the first metal film are shaped using a multi-tone mask which is a first photomask; an insulating film, a first semiconductor film, a second semiconductor film, and a second metal film are sequentially stacked; the second metal film and the second semiconductor film are shaped using a multi-tone mask which is a second photomask; a protective film is formed; the protective film is shaped using a third photomask; a second transparent conductive film is formed; and the second transparent conductive film is shaped using a fourth photomask.
Public/Granted literature
- US20090142867A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2009-06-04
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