Invention Grant
- Patent Title: Halide free glasses having low OH, OD concentrations
- Patent Title (中): 不含OH,OD浓度的无卤素玻璃
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Application No.: US12364083Application Date: 2009-02-02
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Publication No.: US08268740B2Publication Date: 2012-09-18
- Inventor: Richard Michael Fiacco , Kenneth Edward Hrdina , Rostislav Radievich Khrapko , Lisa Anne Moore , Charlene Marie Smith
- Applicant: Richard Michael Fiacco , Kenneth Edward Hrdina , Rostislav Radievich Khrapko , Lisa Anne Moore , Charlene Marie Smith
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B37/018 ; C03B37/01

Abstract:
A fused silica glass having a refractive index homogeneity of less or equal to about 5 ppm over an aperture area of at least about 50 cm2. The fused silica glass is also substantially free of halogens and has an adsorption edge of less than about 160 nm. The glass is dried by exposing a silica soot blank to carbon monoxide before consolidation, reducing the combined concentration of hydroxyl (i.e., OH, where H is protium (11H) and deuteroxyl (OD), where D is deuterium (12H)) of less than about 20 ppm by weight in one embodiment, less than about 5 ppm by weight in another embodiment, and less than about 1 ppm by weight in a third embodiment.
Public/Granted literature
- US20090203512A1 HALIDE FREE GLASSES HAVING LOW OH, OD CONCENTRATIONS Public/Granted day:2009-08-13
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