Invention Grant
- Patent Title: Laser heated discharge plasma EUV source
- Patent Title (中): 激光加热放电等离子体EUV源
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Application No.: US12277623Application Date: 2008-11-25
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Publication No.: US08269199B2Publication Date: 2012-09-18
- Inventor: Malcolm W. McGeoch
- Applicant: Malcolm W. McGeoch
- Applicant Address: US MA Fall River
- Assignee: Plex LLC
- Current Assignee: Plex LLC
- Current Assignee Address: US MA Fall River
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: G21K5/02
- IPC: G21K5/02
Abstract:
A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.
Public/Granted literature
- US20090212241A1 LASER HEATED DISCHARGE PLASMA EUV SOURCE Public/Granted day:2009-08-27
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