Invention Grant
- Patent Title: Cooling structures and methods
- Patent Title (中): 冷却结构和方法
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Application No.: US12275731Application Date: 2008-11-21
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Publication No.: US08269341B2Publication Date: 2012-09-18
- Inventor: Hans-Joachim Barth
- Applicant: Hans-Joachim Barth
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/34
- IPC: H01L23/34

Abstract:
Cooling structures and methods, methods of manufacturing semiconductor devices, and semiconductor devices are disclosed. In one embodiment, a cooling structure for a semiconductor device includes at least one channel defined between a first workpiece and a second workpiece. The second workpiece is bonded to the first workpiece. The at least one channel is adapted to retain a fluid.
Public/Granted literature
- US20100127390A1 Cooling Structures and Methods Public/Granted day:2010-05-27
Information query
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