Invention Grant
US08269944B2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间，将投影透镜下方的间隙中的浸没流体保持在装置和方法
- Patent Title: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
- Patent Title (中): 在浸没式光刻机中的晶片更换期间，将投影透镜下方的间隙中的浸没流体保持在装置和方法
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Application No.: US11882837Application Date: 2007-08-06
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Publication No.: US08269944B2Publication Date: 2012-09-18
- Inventor: Michael Binnard
- Applicant: Michael Binnard
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
A liquid immersion exposure apparatus in which a substrate is exposed to an exposure beam, includes an optical member through which the substrate is exposed to the exposure beam, a cover member having a surface, a first holding system that detachably holds the cover member, and a second holding system that holds the cover member which is released from the first holding system. The surface of the cover member held by the second holding system is opposite to the optical member.
Public/Granted literature
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