Invention Grant
- Patent Title: Electrostatic discharge protection element and electrostatic discharge protection chip and method of producing the same
- Patent Title (中): 静电放电保护元件及静电放电保护芯片及其制造方法
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Application No.: US12533919Application Date: 2009-07-31
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Publication No.: US08270131B2Publication Date: 2012-09-18
- Inventor: Wolfgang Klein , Hans Taddiken , Winfried Bakalski
- Applicant: Wolfgang Klein , Hans Taddiken , Winfried Bakalski
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H02H9/00
- IPC: H02H9/00

Abstract:
An electrostatic discharge (ESD) protection element is described, the ESD protection element including a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.
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