Invention Grant
US08270218B2 Semiconductor memory device comprising memory cell having charge accumulation layer and control gate and method of erasing data thereof
有权
半导体存储器件包括具有电荷累积层和控制栅极的存储单元以及擦除其数据的方法
- Patent Title: Semiconductor memory device comprising memory cell having charge accumulation layer and control gate and method of erasing data thereof
- Patent Title (中): 半导体存储器件包括具有电荷累积层和控制栅极的存储单元以及擦除其数据的方法
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Application No.: US12406503Application Date: 2009-03-18
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Publication No.: US08270218B2Publication Date: 2012-09-18
- Inventor: Hiroshi Maejima
- Applicant: Hiroshi Maejima
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-076578 20080324
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/04

Abstract:
A semiconductor memory device includes a memory cell, a bit line, a source line, and a sense amplifier. The memory cell has a stacked gate including a charge accumulation layer and a control gate. The bit line is electrically connected to a drain of the memory cell. The source line is electrically connected to a source of the memory cell. The sense amplifier, during erase verification to determine whether or not a threshold voltage of the memory cell in an erased state is at a threshold level, reads the data from the memory cell and senses the data with a first voltage applied to the control gate of the memory cell, with a positive second voltage higher than the first voltage applied to the semiconductor substrate and the source line, and with a third voltage higher than the second voltage applied to the bit line.
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