Invention Grant
- Patent Title: Method and apparatus for enhancing in-situ gas flow measurement performance
-
Application No.: US12634568Application Date: 2009-12-09
-
Publication No.: US08271210B2Publication Date: 2012-09-18
- Inventor: Sherk Chung , James MacAllen Chalmers , Jialing Chen , Yi Wang , Paul Tran , Sophia Leonidovna Shtilman , Joseph R. Monkowski
- Applicant: Sherk Chung , James MacAllen Chalmers , Jialing Chen , Yi Wang , Paul Tran , Sophia Leonidovna Shtilman , Joseph R. Monkowski
- Applicant Address: US CA Pleasanton
- Assignee: Pivotal Systems Corporation
- Current Assignee: Pivotal Systems Corporation
- Current Assignee Address: US CA Pleasanton
- Agency: Nixon Peabody LLP
- Agent Joseph Bach, Esq.
- Main IPC: G06F1/34
- IPC: G06F1/34

Abstract:
An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
Public/Granted literature
- US20110137581A1 METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE Public/Granted day:2011-06-09
Information query