Invention Grant
US08272068B2 Scanning probe microscope and sample observing method using the same
有权
扫描探针显微镜及使用其的样品观察方法
- Patent Title: Scanning probe microscope and sample observing method using the same
- Patent Title (中): 扫描探针显微镜及使用其的样品观察方法
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Application No.: US12523369Application Date: 2008-02-26
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Publication No.: US08272068B2Publication Date: 2012-09-18
- Inventor: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- Applicant: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-061201 20070312; JP2007-322722 20071214
- International Application: PCT/JP2008/053268 WO 20080226
- International Announcement: WO2008/111390 WO 20080918
- Main IPC: G01N13/00
- IPC: G01N13/00 ; G01B11/30

Abstract:
In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
Public/Granted literature
- US20100064396A1 SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME Public/Granted day:2010-03-11
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