Invention Grant
- Patent Title: System and method of forming a patterned conformal structure
- Patent Title (中): 形成图案化保形结构的系统和方法
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Application No.: US12263874Application Date: 2008-11-03
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Publication No.: US08276268B2Publication Date: 2012-10-02
- Inventor: Christopher James Kapusta , Donald Paul Cunningham
- Applicant: Christopher James Kapusta , Donald Paul Cunningham
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Ziolkowski Patent Solutions Group, SC
- Agent Jean K. Testa
- Main IPC: H05K3/30
- IPC: H05K3/30 ; H05K3/10

Abstract:
A system and method of forming a patterned conformal structure for an electrical system is disclosed. The conformal structure includes a dielectric coating shaped to conform to a surface of an electrical system, with the dielectric coating having a plurality of openings therein positioned over contact pads on the surface of the electrical system. The conformal structure also includes a patterned conductive coating layered on the dielectric coating and on the contact pads such that an electrical connection is formed between the patterned conductive coating and the contact pads. The patterned conductive coating comprises at least one of an interconnect system, a shielding structure, and a thermal path.
Public/Granted literature
- US20100108370A1 SYSTEM AND METHOD OF FORMING A PATTERNED CONFORMAL STRUCTURE Public/Granted day:2010-05-06
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