Invention Grant
- Patent Title: Reticle etched within optical lens
- Patent Title (中): 在光学透镜内蚀刻的标线片
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Application No.: US12762512Application Date: 2010-04-19
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Publication No.: US08276283B1Publication Date: 2012-10-02
- Inventor: Stanley P. Kopacz , Kimberly A. Griswold
- Applicant: Stanley P. Kopacz , Kimberly A. Griswold
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Secretary of the Army
- Current Assignee: The United States of America as represented by the Secretary of the Army
- Current Assignee Address: US DC Washington
- Agent Henry S. Goldfine
- Main IPC: F41G1/00
- IPC: F41G1/00
Abstract:
A reticle which does not emit a retro-reflective signature detectable using standard field detection means at the standard distance of 10 miles, which reticle is formed of a precise series of about 10 micron wide lines etched within a physically light weight, single optical blank or glass lens, using a femtosecond near IR wavelength pulsed laser.
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