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US08277604B2 Antenna for plasma processor and apparatus 有权
等离子体处理器和设备天线

Antenna for plasma processor and apparatus
Abstract:
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor.
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