Invention Grant
- Patent Title: Nano imprinting method and apparatus
- Patent Title (中): 纳米压印方法和装置
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Application No.: US12489822Application Date: 2009-06-23
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Publication No.: US08277717B2Publication Date: 2012-10-02
- Inventor: Babak Heidari
- Applicant: Babak Heidari
- Applicant Address: SE Malmo
- Assignee: Obducat AB
- Current Assignee: Obducat AB
- Current Assignee Address: SE Malmo
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: EP08158976 20080625
- Main IPC: B29C59/02
- IPC: B29C59/02
Abstract:
The present invention relates to a nano imprint method and to a nano imprint apparatus comprising: a first imprint module, a second imprint module, a storage and a feeder module, wherein; the first imprint module is adapted to imprint a pattern into an intermediate polymer stamp from a template; a second imprint module is adapted to imprint a pattern into a substrate from the intermediate polymer stamp; robot feeder modules are adapted to move the template, intermediate polymer stamp and the substrate from and to storages.
Public/Granted literature
- US20090321990A1 NANO IMPRINTING METHOD AND APPARATUS Public/Granted day:2009-12-31
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