Invention Grant
- Patent Title: Salt and photoresist composition containing the same
- Patent Title (中): 含有其的盐和光致抗蚀剂组合物
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Application No.: US12786726Application Date: 2010-05-25
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Publication No.: US08278023B2Publication Date: 2012-10-02
- Inventor: Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
- Applicant: Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-129356 20090528
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C309/00

Abstract:
A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.
Public/Granted literature
- US20100304292A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME Public/Granted day:2010-12-02
Information query
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