Invention Grant
- Patent Title: Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof
- Patent Title (中): 锍盐,光酸产生剂和可光固化组合物及其固化体
-
Application No.: US12989549Application Date: 2009-04-27
-
Publication No.: US08278030B2Publication Date: 2012-10-02
- Inventor: Issei Suzuki , Hideki Kimura
- Applicant: Issei Suzuki , Hideki Kimura
- Applicant Address: JP Kyoto-shi
- Assignee: San-Apro Limited
- Current Assignee: San-Apro Limited
- Current Assignee Address: JP Kyoto-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2008-120828 20080506
- International Application: PCT/JP2009/001925 WO 20090427
- International Announcement: WO2009/136482 WO 20091112
- Main IPC: G03F7/029
- IPC: G03F7/029 ; C07D495/00 ; C07D335/04 ; C08G59/68 ; C08F2/50

Abstract:
An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X− represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by —S—, —O—, —SO—, —SO2—, or —CO—.
Public/Granted literature
- US20110039205A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF Public/Granted day:2011-02-17
Information query
IPC分类: