Invention Grant
US08278139B2 Passivating glue layer to improve amorphous carbon to metal adhesion
有权
钝化胶层以改善无定形碳与金属的附着力
- Patent Title: Passivating glue layer to improve amorphous carbon to metal adhesion
- Patent Title (中): 钝化胶层以改善无定形碳与金属的附着力
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Application No.: US12566948Application Date: 2009-09-25
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Publication No.: US08278139B2Publication Date: 2012-10-02
- Inventor: Siu F. Cheng , Deenesh Padhi
- Applicant: Siu F. Cheng , Deenesh Padhi
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A method and apparatus is provided for forming a resistive memory device having good adhesion among the components thereof. A first conductive layer is formed on a substrate, and the surface of the first conductive layer is treated to add adhesion promoting materials to the surface. The adhesion promoting materials may form a layer on the surface, or they may incorporate into the surface or merely passivate the surface of the first conductive layer. A variable resistance layer is formed on the treated surface, and a second conductive layer is formed on the variable resistance layer. Adhesion promoting materials may also be included at the interface between the variable resistance layer and the second conductive layer.
Public/Granted literature
- US20110076826A1 PASSIVATING GLUE LAYER TO IMPROVE AMORPHOUS CARBON TO METAL ADHESION Public/Granted day:2011-03-31
Information query
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