Invention Grant
US08278192B2 Trench formation method for releasing a thin-film substrate from a reusable semiconductor template
有权
用于从可重复使用的半导体模板中释放薄膜基板的沟槽形成方法
- Patent Title: Trench formation method for releasing a thin-film substrate from a reusable semiconductor template
- Patent Title (中): 用于从可重复使用的半导体模板中释放薄膜基板的沟槽形成方法
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Application No.: US12702187Application Date: 2010-02-08
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Publication No.: US08278192B2Publication Date: 2012-10-02
- Inventor: David Xuan-Qi Wang , Mehrdad Moslehi
- Applicant: David Xuan-Qi Wang , Mehrdad Moslehi
- Applicant Address: US CA Milpitas
- Assignee: Solexel
- Current Assignee: Solexel
- Current Assignee Address: US CA Milpitas
- Agency: Hulsey, P.C.
- Agent William N. Hulsey, III; John R. C. Wood
- Main IPC: H01L21/46
- IPC: H01L21/46 ; H01L21/76

Abstract:
A method is provided for fabricating a thin-film semiconductor substrate by forming a porous semiconductor layer conformally on a reusable semiconductor template and then forming a thin-film semiconductor substrate conformally on the porous semiconductor layer. An inner trench having a depth less than the thickness of the thin-film semiconductor substrate is formed on the thin-film semiconductor substrate. An outer trench providing access to the porous semiconductor layer is formed on the thin-film semiconductor substrate and is positioned between the inner trench and the edge of the thin-film semiconductor substrate. The thin-film semiconductor substrate is then released from the reusable semiconductor template.
Public/Granted literature
- US20100203711A1 Trench Formation Method For Releasing A Thin-Film Substrate From A Reusable Semiconductor Template Public/Granted day:2010-08-12
Information query
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