Invention Grant
US08278192B2 Trench formation method for releasing a thin-film substrate from a reusable semiconductor template 有权
用于从可重复使用的半导体模板中释放薄膜基板的沟槽形成方法

  • Patent Title: Trench formation method for releasing a thin-film substrate from a reusable semiconductor template
  • Patent Title (中): 用于从可重复使用的半导体模板中释放薄膜基板的沟槽形成方法
  • Application No.: US12702187
    Application Date: 2010-02-08
  • Publication No.: US08278192B2
    Publication Date: 2012-10-02
  • Inventor: David Xuan-Qi WangMehrdad Moslehi
  • Applicant: David Xuan-Qi WangMehrdad Moslehi
  • Applicant Address: US CA Milpitas
  • Assignee: Solexel
  • Current Assignee: Solexel
  • Current Assignee Address: US CA Milpitas
  • Agency: Hulsey, P.C.
  • Agent William N. Hulsey, III; John R. C. Wood
  • Main IPC: H01L21/46
  • IPC: H01L21/46 H01L21/76
Trench formation method for releasing a thin-film substrate from a reusable semiconductor template
Abstract:
A method is provided for fabricating a thin-film semiconductor substrate by forming a porous semiconductor layer conformally on a reusable semiconductor template and then forming a thin-film semiconductor substrate conformally on the porous semiconductor layer. An inner trench having a depth less than the thickness of the thin-film semiconductor substrate is formed on the thin-film semiconductor substrate. An outer trench providing access to the porous semiconductor layer is formed on the thin-film semiconductor substrate and is positioned between the inner trench and the edge of the thin-film semiconductor substrate. The thin-film semiconductor substrate is then released from the reusable semiconductor template.
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