Invention Grant
- Patent Title: Method for purifying chemical added with chelating agent
- Patent Title (中): 化学添加螯合剂的方法
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Application No.: US12517313Application Date: 2007-11-30
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Publication No.: US08278219B2Publication Date: 2012-10-02
- Inventor: Masamitsu Iiyama , Mitsugu Abe
- Applicant: Masamitsu Iiyama , Mitsugu Abe
- Applicant Address: JP Atsugi-shi
- Assignee: Nomura Micro Science Co., Ltd.
- Current Assignee: Nomura Micro Science Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Agency: Foley & Lardner LLP
- Priority: JP2006-327624 20061204
- International Application: PCT/JP2007/073192 WO 20071130
- International Announcement: WO2008/069136 WO 20080612
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461
Abstract:
A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.
Public/Granted literature
- US20100078589A1 METHOD FOR PURIFYING CHEMICAL ADDED WITH CHELATING AGENT Public/Granted day:2010-04-01
Information query
IPC分类:
