Invention Grant
- Patent Title: Method for producing ruthenium compound
- Patent Title (中): 钌化合物的制备方法
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Application No.: US13279957Application Date: 2011-10-24
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Publication No.: US08278471B2Publication Date: 2012-10-02
- Inventor: Ryuuichi Saitou , Kang-go Chung , Hideki Nishimura , Tatsuya Sakai , Sanshiro Komiya , Naoto Noda , Maki Nishiguchi
- Applicant: Ryuuichi Saitou , Kang-go Chung , Hideki Nishimura , Tatsuya Sakai , Sanshiro Komiya , Naoto Noda , Maki Nishiguchi
- Applicant Address: JP Tokyo JP Uenohara-shi
- Assignee: JSR Corporation,Tri Chemical Laboratories Inc.
- Current Assignee: JSR Corporation,Tri Chemical Laboratories Inc.
- Current Assignee Address: JP Tokyo JP Uenohara-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-238625 20101025
- Main IPC: C07F15/00
- IPC: C07F15/00

Abstract:
A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL02 (wherein L0 represents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds) with trifluorophosphine or reacting the compound represented by General Formula (1) with trifluorophosphine, and hydrogen or a halogen to obtain a compound represented by General Formula (2): Ru(PF3)l(L1)m(L2)n (wherein L1 represents a hydrogen atom or halogen atom, L2 represents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds, l is an integer from 1 to 5, m is an integer from 0 to 4, and n is an integer from 0 to 2, provided that l+m+2n=5 or 6). With this method, a trifluorophosphine-ruthenium compound can be synthesized under low-temperature and low-pressure conditions.
Public/Granted literature
- US20120101290A1 METHOD FOR PRODUCING RUTHENIUM COMPOUND Public/Granted day:2012-04-26
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