Invention Grant
US08278634B2 System and method for ion implantation with improved productivity and uniformity
有权
用于离子注入的系统和方法,提高生产率和均匀性
- Patent Title: System and method for ion implantation with improved productivity and uniformity
- Patent Title (中): 用于离子注入的系统和方法,提高生产率和均匀性
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Application No.: US12796215Application Date: 2010-06-08
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Publication No.: US08278634B2Publication Date: 2012-10-02
- Inventor: Bo H. Vanderberg , Steven C. Hays , Andy Ray
- Applicant: Bo H. Vanderberg , Steven C. Hays , Andy Ray
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J37/317
- IPC: H01J37/317

Abstract:
A method comprising introducing an injected gas (e.g., Argon, Xenon) into a beam line region comprising a magnetic scanner is provided herein. The injected gas improves beam current by enhancing (e.g., increasing, decreasing) charge neutralization of the magnetic ion beam (e.g., the ion beam at regions where the scanning magnetic field is non-zero) thereby reducing the current loss due to the zero field effect (ZFE). By reducing the current loss in regions having a magnetic field, the magnetic beam current is increased (e.g., the beam current is increased in regions where the magnetic field is non-zero) raising the overall beam current in a uniform manner over an entire scan path and thereby reducing the effect of the ZFE. In other words, the ZFE is removed by effectively minimizing it through an increase in the magnetized beam current.
Public/Granted literature
- US20100308215A1 System and Method for Ion Implantation with Improved Productivity and Uniformity Public/Granted day:2010-12-09
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