Invention Grant
- Patent Title: Radiation sources and methods of generating radiation
- Patent Title (中): 辐射源和产生辐射的方法
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Application No.: US12540596Application Date: 2009-08-13
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Publication No.: US08278636B2Publication Date: 2012-10-02
- Inventor: Erik Roelof Loopstra , Hendrikus Gijsbertus Schimmel
- Applicant: Erik Roelof Loopstra , Hendrikus Gijsbertus Schimmel
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G21K1/00
- IPC: G21K1/00

Abstract:
A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.
Public/Granted literature
- US20100039631A1 RADIATION SOURCES AND METHODS OF GENERATING RADIATION Public/Granted day:2010-02-18
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