Invention Grant
- Patent Title: Pressure sensor and method
- Patent Title (中): 压力传感器和方法
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Application No.: US12651623Application Date: 2010-01-04
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Publication No.: US08278727B2Publication Date: 2012-10-02
- Inventor: Thoralf Kautzsch , Marco Müller , Dirk Meinhold , Ben Rosam , Klaus Elian , Stefan Kolb
- Applicant: Thoralf Kautzsch , Marco Müller , Dirk Meinhold , Ben Rosam , Klaus Elian , Stefan Kolb
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Banner & Witcoff, Ltd.
- Main IPC: G01L9/00
- IPC: G01L9/00

Abstract:
A method for providing a pressure sensor substrate comprises creating a first cavity that extends inside the substrate in a first direction perpendicular to a main surface of the substrate, and that extends inside the substrate, in a second direction perpendicular to the first direction, into a first venting area of the substrate; creating a second cavity that extends in the first direction inside the substrate, that extends in parallel to the first cavity in the second direction, and that does not extend into the first venting area; and opening the first cavity in the first venting area.
Public/Granted literature
- US20110163395A1 Pressure Sensor and Method Public/Granted day:2011-07-07
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